A New Take on Kinetics: Initiated Chemical Vapor Deposition as a Chemical Engineering Capstone Laboratory
AbstractNo abstract available.
Daniel Burkey is the Associate Dean of Undergraduate Programs and Associate Professor-in- Residence in the Department of Chemical and Biomolecular Engineering at the University of Connecticut. He received his B.S. in chemical engineering from Lehigh University in 1998, and his M.S.C.E.P and Ph.D. in chemical engineering from the Massachusetts Institute of Technology in 2000 and 2003, respectively. His primary areas of interest are chemical vapor deposition and engineering pedagogy.
Daniel Anastasio received his B.S. in chemical engineering from the University of Connecticut in 2009. He is pursuing a Ph.D. in chemical engineering at the University of Connecticut while acting as an instructional specialist for the chemical engineering undergraduate laboratory. His research interests include osmotically driven membrane separations and engineering pedagogy.
Aravind Suresh is an Assistant Professor-in-Residence in the chemical engineering program at the University of Connecticut. He received his B.Tech in chemical engineering from the National Institute of Technology in India in 2004, and his Ph.D. in chemical engineering from the University of Connecticut in 2011. His primary areas of research interest are synthesis, structural, and functional characterization of ceramics.