Stress Effect Analysis for PD SOI pMOSFETs with Undoped-Si<SUB>0.88</SUB>Ge<SUB>0.12</SUB> Heterostructure Channel

Authors

  • Sang-Sik CHOI
  • A-Ram CHOI
  • Jae-Yeon KIM
  • Jeon-Wook YANG
  • Yong-Woo HWANG
  • Tae-Hyun HAN
  • Deok Ho CHO
  • Kyu-Hwan SHIM

Published

2008-05-01

Issue

Section

Papers