Thermally Robust Nickel Silicide Process for Nano-Scale CMOS Technology

Authors

• Soon-Young OH
• Jang-Gn YUN
• Bin-Feng HUANG
• Yong-Jin KIM
• Hee-Hwan JI
• Sang-Bum HUH
• Han-Seob CHA
• Ui-Sik KIM
• Jin-Suk WANG
• Hi-Deok LEE