Characterization of Atom Diffusion in Polycrystalline Si/SiGe/Si Stacked Gate

Authors

  • Hideki MURAKAMI
  • Yoshikazu MORIWAKI
  • Masafumi FUJITAKE
  • Daisuke AZUMA
  • Seiichiro HIGASHI
  • Seiichi MIYAZAKI

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Published

2005-04-01

Issue

Vol. E88-C, No. 4 April 2005

Section

Papers